Studies of the gas-phase reactive intermediates formed by heterogeneous processes in chlorosilane chemical vapor deposition using photoelectron spectroscopy and mass spectrometry
- 1 January 1990
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry
- Vol. 94 (1) , 327-331
- https://doi.org/10.1021/j100364a055
Abstract
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