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  3. Substrate temperature dependence of subcutaneous oxidation at Si/SiO2 interfaces formed by remote plasma-enhanced chemical vapor deposition
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  5. 10.1116/1.576802
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  3. Substrate temperature dependence of subcutaneous oxidation at Si/SiO2 interfaces formed by remote plasma-enhanced chemical vapor deposition
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  5. 10.1116/1.576802

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