Chemically Vapor Deposited Cu Films on Ar-Plasma-Treated TiN Substrate

• 15 January 2002
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 41  (Part 1, No) , 280-286
• https://doi.org/10.1143/jjap.41.280

Abstract

Keywords

• TREATED TIN
• CU FILMS
• AR PLASMA
• TIN SUBSTRATE
• PLASMA TREATED
• VAPOR DEPOSITED CU