Low-pressure chemical vapor deposition silicon–oxynitride films for integrated optics
- 20 April 1992
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 31 (12) , 2036-2040
- https://doi.org/10.1364/ao.31.002036
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
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