TiSi2 / n + Poly ‐ Si Gate Electrode Patterning by Plasma Etching Using CF 2Cl2 O 2
- 1 May 1984
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 131 (5) , 1217-1218
- https://doi.org/10.1149/1.2115783
Abstract
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