The sputtering yield of polycrystalline materials
- 1 January 1980
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 51 (3) , 241-247
- https://doi.org/10.1080/00337578008210006
Abstract
Measurements were made of the sputtering yield of polycrystalline niobium due to 15 kev argon ion bombardment. The crystallographic orientations of individual grains were carefully surveyed using selected area electron channeling patterns. It was demonstrated that the average yield behavior could be calculated from theory provided allowance was made for ion channeling. The method for calculating yields can be applied to any combination of ion-polycrystalline target material provided the distribution of grain orientations (texture) is known.Keywords
This publication has 8 references indexed in Scilit:
- The behaviour of surfaces under ion bombardmentReports on Progress in Physics, 1975
- Binding energies in cubic metal surfacesRadiation Effects, 1973
- Precision measurements on the angular and temperature dependence of sputteringRadiation Effects, 1972
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Microtopography of surfaces eroded by ion-bombardmentJournal of Materials Science, 1969
- Single-crystal sputtering including the channeling phenomenonCanadian Journal of Physics, 1968
- Some comments on the interpretation of the ‘kikuchi-like reflection patterns’ observed by scanning electron microscopyPhilosophical Magazine, 1967
- Sputtering Yields for Normally Incident-Ion Bombardment at Low Ion EnergyPhysical Review B, 1957