The effect of channel hot electron stress on a.c. device characteristics of MOSFETs
- 31 October 1986
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 29 (10) , 1053-1057
- https://doi.org/10.1016/0038-1101(86)90105-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Effect of hot-electron stress on low frequency MOSFET noiseIEEE Electron Device Letters, 1984
- A reliable approach to charge-pumping measurements in MOS transistorsIEEE Transactions on Electron Devices, 1984
- Interface states in MOSFETs due to hot-electron injection determined by the charge pumping techniqueElectronics Letters, 1981
- Model for 1/f; noise in MOS transistors biased in the linear regionSolid-State Electronics, 1980