Effect of Solvents and Concentration on the Formation of a Self-Assembled Monolayer of Octadecylsiloxane on Silicon (001)
- 21 January 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 19 (4) , 1182-1188
- https://doi.org/10.1021/la025906s
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Self-Assembly of n-Alkanethiols: A Kinetic Study by Second Harmonic GenerationThe Journal of Physical Chemistry B, 1999
- Structure of self-assembled layers on silicon: Combined use of spectroscopic variable angle ellipsometry, neutron reflection, and atomic force microscopyJournal of Applied Physics, 1999
- Formation of Self-Assembled Octadecylsiloxane Monolayers on Mica and Silicon Surfaces Studied by Atomic Force Microscopy and Infrared SpectroscopyThe Journal of Physical Chemistry B, 1998
- Octadecyltrichlorosilane self-assembled-monolayer islands as a self-patterned-mask for HF etching of SiO2 on SiJournal of Vacuum Science & Technology A, 1998
- Formation and Structure of Self-Assembled MonolayersChemical Reviews, 1996
- An Intrinsic Relationship between Molecular Structure in Self-Assembled n-Alkylsiloxane Monolayers and Deposition TemperatureThe Journal of Physical Chemistry, 1994
- Erratum: X-ray grazing incidence diffraction from alkylsiloxane monolayers on silicon wafers [J. Chem. Phys. 95, 2854 (1991)]The Journal of Chemical Physics, 1993
- Wetting films on chemically modified surfaces: An x-ray studyPhysical Review B, 1991
- X-ray grazing incidence diffraction from alkylsiloxane monolayers on silicon wafersThe Journal of Chemical Physics, 1991
- Structure and reactivity of alkylsiloxane monolayers formed by reaction of alkyltrichlorosilanes on silicon substratesLangmuir, 1989