Distribution of hydrogen in the NPL standard ta2O5 films
- 1 July 1986
- journal article
- Published by Wiley in Surface and Interface Analysis
- Vol. 9 (2) , 105-109
- https://doi.org/10.1002/sia.740090205
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Atomic mixing and electron range effects in ultrahigh-resolution profiles of the Ta2O5/Ta interface by argon sputtering with Auger electron spectroscopyJournal of Applied Physics, 1984
- Characterization of a high depth‐resolution tantalum pentoxide sputter profiling reference materialSurface and Interface Analysis, 1983
- The depth dependence of the depth resolution in composition–depth profiling with Auger Electron SpectroscopySurface and Interface Analysis, 1983
- An accurate and sensitive method for the determination of the depth distribution of light elements in heavy materialsJournal of Applied Physics, 1976
- Hydrogen Diffusion in MetalsPublished by Elsevier ,1975