Chemisorption of HCl, Cl2 and F2 on the Si(100) surface
- 1 February 1992
- journal article
- Published by Elsevier in Surface Science
- Vol. 262 (1-2) , 235-244
- https://doi.org/10.1016/0039-6028(92)90474-k
Abstract
No abstract availableThis publication has 36 references indexed in Scilit:
- Si surface study after Ar ion-assisted Cl2 etchingJournal of Vacuum Science & Technology B, 1986
- Electronic properties and bonding sites for chlorine chemisorption on Si(111)-(7×7)Physical Review B, 1985
- Spectroscopic characterization of fluorinated silicon single crystal surfacesJournal of Vacuum Science & Technology A, 1984
- Ab initiocluster study of the interaction of fluorine and chlorine with the Si(111) surfacePhysical Review B, 1983
- Structural determination of Cl chemisorption on Si{111} and Ge{111} by total-energy minimizationPhysical Review B, 1983
- Direct structural study of Cl on Si {111} and Ge {111} surfaces: New conclusionsPhysical Review B, 1983
- Bonding geometries of Cl on Si{111} and Ge{111}Journal of Vacuum Science & Technology B, 1983
- Rate-determining reactions and surface species in CVD of silicon: II. The SiH2Cl2-H2-N2-HCL systemJournal of Crystal Growth, 1980
- Nature of conduction-band surface resonances for Si(111) surfaces with and without chemisorbed overlayersPhysical Review B, 1978
- Chemisorption of chlorine on Si(111) 7 × 7 and 1 × 1 surfacesPhysical Review B, 1977