Thin Film Monitoring with Ellipsometry in In-Line Processing Equipment
- 1 November 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (11R) , 2514-2518
- https://doi.org/10.1143/jjap.29.2514
Abstract
An ellipsometer for in-line monitoring has been developed. The construction is simple and it determines both the refractive index and thickness of a film in about 5 seconds through a simple and fast calculation method. The ellipsometer was set under an unloading chamber of in-line processing equipment and the optical alignment was adjusted with a simple method. For examination, SIN x films have been monitored. The results have been that the measurement was precise and the in-line monitoring of the film was successively performed.Keywords
This publication has 2 references indexed in Scilit:
- Ellipsometric monitor for process controlApplied Optics, 1989
- Design and Operation of ETA, an Automated EllipsometerIBM Journal of Research and Development, 1973