Effects of boron implantation in films of iron‐nickel
- 15 April 1988
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 63 (8) , 4312-4314
- https://doi.org/10.1063/1.340212
Abstract
We have implantedboronions into films of Fe‐Ni alloy composition. A homogeneous distribution of boron was determined from the sputter Auger analysis with a concentration of 18% and 34% for low‐ and high‐dose implantation, respectively. The resistivity of film was increased by a factor of 2 and 4 as a result of low‐ and high‐dose implantation, respectively. The magnetic properties of these films are studied as a function of annealing temperature by using FMR measurements. Both the uniaxial anisotropy field and FMR linewidth are dramatically decreased as a result of annealing at elevated temperatures. The changes of effective magnetization of these films are strongly dependent on implantedboron concentration.This publication has 5 references indexed in Scilit:
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