A variable energy focused ion beam system for i n s i t u microfabrication

• 1 May 1988
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 6  (3) , 966-973
• https://doi.org/10.1116/1.584289

Abstract

Keywords

• ARSENIC
• MONTE CARLO
• MONTE CARLO METHOD
• ION BEAM
• THRESHOLD VOLTAGE
• SPACE CHARGE
• GALLIUM ARSENIDE
• MOLECULAR BEAM EPITAXY
• FOCUSED ION BEAM
• SEMICONDUCTOR DEVICES