Inverse frequency dependence of simultaneous tone-on-tone masking patterns at low levels

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Abstract
Using the Bekesy tracking method, tone-on-tone masking patterns were measured with 8 [human] subjects at 8 masker frequencies between 250 Hz and 6.03 kHz. Masking patterns were obtained for 5 masker levels between 20-60 dB SPL [sound pressure level]. Test-tone frequencies were chosen within 2 critical bands above and below the masker frequency. A level-dependent frequency asymmetry of masking was observed at all masker frequencies except at 250 Hz. At low levels there was a greater spread of masking towards the lower frequencies than toward the higher frequencies, but at high levels there was a greater spread of masking towards the higher frequencies than toward the lower frequencies. Only at masker levels of 40 dB SPL were the masking patterns approximately symmetrical.

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