Origins of stress-induced perpendicular magnetic anisotropy of sputtered iron oxide thin films
- 1 September 1986
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 22 (5) , 594-596
- https://doi.org/10.1109/tmag.1986.1064581
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Properties of RF sputtered iron oxide thin films with CoCr and Nb as dopantsIEEE Transactions on Magnetics, 1985
- Mechanical stresses in D.C. reactively sputtered Fe2O3 thin filmsThin Solid Films, 1980
- Internal Stress of Evaporated Thin Gold FilmsJapanese Journal of Applied Physics, 1965
- Modification of the lunar surface by the solar-wind bombardmentPlanetary and Space Science, 1963