Synchrotron Radiation‐Excited Chemical Vapor Deposition of Silicon Nitride Films from a SiH4 + NH 3 Gas Mixture
- 1 November 1991
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 138 (11) , 3412-3416
- https://doi.org/10.1149/1.2085424
Abstract
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