Internal Stress of Electrodeposited Nickel-Iron Films
- 1 July 1967
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 6 (7)
- https://doi.org/10.1143/jjap.6.895
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Magnetic Domain Structures of Electrodeposited Nickel-Iron FilmsJapanese Journal of Applied Physics, 1965
- Electrodeposited Nickel-Iron-Molybdenum Thin Magnetic FilmsJournal of the Electrochemical Society, 1965
- The Electrodeposition of Nickel-Iron-Phosphorus Thin Films for Computer Memory UseJournal of the Electrochemical Society, 1964
- 電着層の内部応力に関する研究（第1報）硫酸々性硫酸銅溶液の電解による電着銅層の内部応力と電流密度並びに温度との関係Denki Kagaku, 1951
- The tension of metallic films deposited by electrolysisProceedings of the Royal Society of London. Series A, Containing Papers of a Mathematical and Physical Character, 1909