Critical Process Variables for UV-Ozone Etching of Photoresist
- 24 October 1993
- journal article
- Published by Springer Nature in MRS Proceedings
- Vol. 315 (1) , 237-242
- https://doi.org/10.1557/proc-315-237
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Kinetics of UV/O2 Cleaning and Surface Passivation: Experiments and ModelingMRS Proceedings, 1992
- Preoxidation UV Treatment of Silicon WafersJournal of the Electrochemical Society, 1987
- UV/ozone cleaning of surfacesJournal of Vacuum Science & Technology A, 1985
- Implications of Data on the Gas Phase Decomposition of OzonePublished by American Chemical Society (ACS) ,1959