Anisotropic etching of silicon at high pressure
- 1 April 1993
- journal article
- research article
- Published by Elsevier in Journal of Electroanalytical Chemistry
- Vol. 348 (1-2) , 473-479
- https://doi.org/10.1016/0022-0728(93)80154-a
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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