Radiation Hardening Applications

• 1 January 1972
• book chapter
• Published by Springer Nature
• p. 87-98
• https://doi.org/10.1007/978-1-4615-9609-7_8

Abstract

Keywords

• SILICON NITRIDE
• BIPOLAR TRANSISTOR
• SILICON DIOXIDE FILM
• GATE THRESHOLD
• SILICON OXYNITRIDE