Binary and phase shifting mask design for optical lithography
- 1 May 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Semiconductor Manufacturing
- Vol. 5 (2) , 138-152
- https://doi.org/10.1109/66.136275
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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