Ultra-high vacuum preparation and characterization of ultra-thin layers of SiO2 on ZrO2 and TiO2 by chemical vapour deposition of Si(OEt)4
- 1 January 1987
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of the Chemical Society, Chemical Communications
- No. 16,p. 1248-1249
- https://doi.org/10.1039/c39870001248
Abstract
SiO2 overlayers, prepared by chemical vapour deposition of Si(OEt)4, were identified by ion scattering spectroscopy and Auger electron spectroscopy to be ultra-thin films uniformly coating ZrO2, but this was not the case for TiO2.Keywords
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