Ultraviolet laser-induced oxidation of silicon: The effect of oxygen photodissociation upon oxide growth kinetics
- 1 November 1988
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 64 (9) , 4410-4414
- https://doi.org/10.1063/1.341263
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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