Structural aspects of the reaction of Ni with Si{111} surfaces
- 1 June 1985
- journal article
- other
- Published by Elsevier in Surface Science
- Vol. 155 (2-3) , L292-L296
- https://doi.org/10.1016/0039-6028(85)90004-4
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Formation and structure of epitaxial nickel silicide on Si{111}Physical Review B, 1983
- Formation of Ultrathin Single-Crystal Silicide Films on Si: Surface and Interfacial Stabilization of Si-NiEpitaxial StructuresPhysical Review Letters, 1983
- Formation and structure of epitaxial NiSi2 and CoSi2Thin Solid Films, 1982
- Epitaxial silicidesThin Solid Films, 1982
- Cross-sectional transmission electron microscopy of silicon-silicide interfacesJournal of Applied Physics, 1981