High-speed Si/SiGe technology for next generation wireless system applications
- 1 May 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (3) , 1541-1548
- https://doi.org/10.1116/1.589936
Abstract
Si/SiGe integrated circuit technology represents a revolutionary opportunity to combine high-performance digital, analog, and rf circuits on a common substrate. The outstanding high-frequency performance of the Si/SiGe devices, combined with the high levels of integration of complementary metal–oxide–semiconductors will contribute to a long-term “paradigm shift” in the architectural partitioning of high-frequency high-performance wireless systems. This article outlines the key future systems applications for the technology.Keywords
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