Properties of large-area nanomagnet arrays with 100 nm period made by interferometric lithography
- 15 April 1999
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 85 (8) , 6160-6162
- https://doi.org/10.1063/1.370029
Abstract
A method is presented for the fabrication of large-area arrays of magnetic particles with 100 nm period, using achromatic interferometric lithography combined with etching, electrodeposition, or an evaporation and liftoff processes. These “nanomagnet” arrays have applications in patterned magnetic media, in magnetic memories, and for studies of particle interactions.This publication has 11 references indexed in Scilit:
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