The influence of hydrogen gas on the characteristics of amorphous silicon deposited by RF sputtering
- 31 October 1982
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 25 (10) , 1011-1016
- https://doi.org/10.1016/0038-1101(82)90025-9
Abstract
No abstract availableKeywords
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