Structural Analysis of Electroless Deposits in the Diffusion-Limited Regime
- 28 November 1994
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 73 (22) , 2998-3001
- https://doi.org/10.1103/physrevlett.73.2998
Abstract
We discuss the actual relevance of thin gap geometry electrodeposition to generate fractal patterns that mimic the morphology of Witten and Sander's diffusion-limited aggregates (DLA). We show that electroless deposition is a good candidate to meet the requirements for diffusion to be the rate limiting step of the growth process. We use the wavelet transform microscope to provide a comparative structural characterization of both experimental electroless deposits and numerical DLA clusters.Keywords
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