Restrained Diffusion of Boron and Phosphorus in Silicon under HCl ‐ Added Oxygen Atmosphere
- 1 September 1976
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 123 (9) , 1416-1417
- https://doi.org/10.1149/1.2133089
Abstract
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