Oxidation Kinetics of Waveguide Roughness Minimization in Silicon Microphotonics
- 1 January 2003
- proceedings article
- Published by Optica Publishing Group
Abstract
Waveguide roughness causes severe signal attenuation in Si waveguides. Oxidation smoothing kinetics are simulated using SUPREME and measured by AFM. We find short period roughness is reduced fastest and an unexpected saturation phenomenon in oxidation smoothing kinetics. Waveguide transmission experiments are reported.Keywords
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