Chemical vapor deposition of (Ba,Sr)TiO3 thin films for application in gigabit scale dynamic random access memories
- 1 January 1997
- journal article
- Published by Taylor & Francis in Integrated Ferroelectrics
- Vol. 14 (1-4) , 33-42
- https://doi.org/10.1080/10584589708019974
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Chemical Vapor Deposition of ( Ba , Sr ) TiO3Journal of the Electrochemical Society, 1995
- Step Coverage and Electrical Properties of (Ba, Sr)TiO3 Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM)2Japanese Journal of Applied Physics, 1994
- Dielectric breakdown in high-ε films for ULSI DRAMs: II. barium-strontium titanate ceramicsIntegrated Ferroelectrics, 1994