Transfer of continuous-relief diffractive structures into diamond by use of inductively coupled plasma dry etching

The transfer of continuous-relief diffractive structures from resist into diamond by use of direct-write electron-beam lithography followed by dry etching in an inductively coupled plasma is demonstrated. The gases used for the diamond etching are ${\mathrm{O}}_2$ and Ar. The chemical-vapor-deposited diamond substrate is of optical quality. Our results show that the transfer process generates fairly smooth etched structures. Blazed gratings with periods of $45 \mu \mathrm{m}$ and Fresnel lenses have been manufactured. The blazed gratings have been optically evaluated with a femtosecond laser operating at 400 nm. The diffraction efficiency was 68% in the first order, with a theoretical value of 100%. We intend to investigate the transfer process further and then to fabricate diffractive and refractive elements for use with Nd:YAG high-power lasers.