Mechanism for anisotropic etching of photoresist-masked, polycrystalline silicon in HBr plasmas
- 1 January 1996
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 14 (1) , 85-90
- https://doi.org/10.1116/1.588439
Abstract
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