Pulsed Power Technology and Its Applications at Extreme Energy-Density Research Institute (EDI), Nagaoka

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Abstract
Recent activities conserning pulsed power technology and its applications are reviewed. Using high-density ablation plasma produced due to the short range of an ion beam in targets, we have successfully prepared crystallized B4C thin films by ion-beam evaporation, which are characterized by hardness, wear resistance, and stability at high temperatures. Fullerenes have been prepared as well. Ultrafine nanosize powders were synthesized by pulsed wire discharge. Flue gas treatment of NO x was achieved by intense pulsed relativistic electron beam. Foil acceleration was observed to be ∼8 km/s at the ablation pressure of 13 GPa. Pulsed laser deposition was used to prepare (Cr1-x , Al x )N films. The AlN solubility limit was found to be 77 at.% AlN. The hardness of the films increases with x up to 0.75, and decreases rapidly due to their being amorphous in structure. A highly repetitive, new pulsed power generator is operational, with the specifications of 400 kV, 13 kA, 120 ns, and 1 pps.