Linewidth control in 1:1 SR lithography
- 30 April 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 21 (1-4) , 87-90
- https://doi.org/10.1016/0167-9317(93)90033-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Aerial image formation in synchrotron-radiation-based x-ray lithography: The whole pictureJournal of Vacuum Science & Technology B, 1990
- High-performance synchrotron orbital radiation x-ray stepperJournal of Vacuum Science & Technology B, 1990