Formation of Amorphous Silicon by the Low-Temperature Tunneling Reaction of H Atoms with Solid Thin Film of SiH4 at 10 K
- 30 June 2001
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry B
- Vol. 105 (29) , 6950-6955
- https://doi.org/10.1021/jp010553b
Abstract
No abstract availableKeywords
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