Reactive ion etching of crystalline quartz
- 1 August 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 82 (1) , L117-L119
- https://doi.org/10.1016/0040-6090(81)90571-x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Selective etching of SiO2 relative to Si by plasma reactive sputter etchingJournal of Vacuum Science and Technology, 1980
- CF 4 Etching in a Diode SystemJournal of the Electrochemical Society, 1979
- The Loading Effect in Plasma EtchingJournal of the Electrochemical Society, 1977