Enhanced Deposition in Electron Beam Targets Due to Beam Stagnation
- 21 February 1977
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 38 (8) , 398-401
- https://doi.org/10.1103/physrevlett.38.398
Abstract
When a 1-MV, 315-kA, self-pinched electron beam is focused onto a thin-wall spherical target, the energy deposition per unit mass is 5 times larger than for a similar beam interacting with a thick target. Numerical modeling of the electron flow in the diode indicates that modification of electric and magnetic fields and electron trajectories by the target produces multiple passes through a thin target and an increase in beam electron density in the target. This produces the enhanced energy deposition in the target.Keywords
This publication has 10 references indexed in Scilit:
- Seeded Megagauss Turbulence in Dense Fusion-Target PlasmasPhysical Review Letters, 1975
- Two-dimensional ion effects in relativistic diodesJournal of Vacuum Science and Technology, 1975
- Model for Conversion of Intense-Electron-Beam Energy into Radially Converging Ion FluxesPhysical Review Letters, 1975
- Interaction of Relativistic Electron Beams with Fusion-Target Blowoff PlasmasPhysical Review Letters, 1975
- Multiple reflections of electrons and the possibility of intense positive-ion flow in high ν/γ diodesJournal of Applied Physics, 1975
- Relativistic Brillouin flow in the high ν/γ diodeJournal of Applied Physics, 1975
- Production of intense megavolt ion beams with a vacuum reflex dischargeApplied Physics Letters, 1975
- Coupled Electron/Photon Transport in Static External Magnetic FieldsIEEE Transactions on Nuclear Science, 1975
- Electron beam focusing and application to pulsed fusionNuclear Fusion, 1974
- Initiation of thermonuclear reactions by high-current electron beamsNuclear Fusion, 1972