(ArO)+ and (ArO2)+ ions in rf sputter deposition discharges
- 15 July 1986
- journal article
- letter
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 60 (2) , 837-839
- https://doi.org/10.1063/1.337384
Abstract
Glow discharge mass spectrometry was used to study the occurrence of argon–oxygen ions in rf‐diode sputter deposition discharges. The results show that (ArO)+ and (ArO2)+ ions are formed over an extensive range of Ar–O2 sputtering gas mixtures. The populations of these ions are independent of whether a ZnO or Au target is used and coupled in a manner that indicates (ArO2)+ is formed first then dissociates to form (ArO)+. An associative ionization reaction between an Ar atom in a highly excited long‐lived Rydberg state and ground state O2 is proposed to be responsible.This publication has 17 references indexed in Scilit:
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