X-Ray Diffraction Study of Argon Crystal Growth
- 1 September 1965
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 36 (9) , 2682-2685
- https://doi.org/10.1063/1.1714560
Abstract
Diffraction studies were carried out near 4°K on the influence of rate and method of growth upon the perfection and microstructure of 99.998% purity argon crystals. The crystallography of the twinning observed was directly verified to be of the type expected for a fcc crystal. Some idea of the dislocation content of a well‐annealed argon crystal was obtained. It was concluded that it should be possible to produce crystals having a perfection adequate for a variety of quantitative lattice studies.This publication has 12 references indexed in Scilit:
- Crystal Growth and Thermal Etching of ArgonJournal of Applied Physics, 1965
- High-Voltage Laue X-ray Photography of Large Single CrystalsScience, 1964
- New Crystalline Phase in Solid Argon and Its Solid SolutionsThe Journal of Chemical Physics, 1964
- Some observations on growing crystals of argonActa Crystallographica, 1962
- Self-diffusion coefficient in solid argonIl Nuovo Cimento (1869-1876), 1962
- Growth and Photomicrographical Observation of Argon CrystalsJournal of Applied Physics, 1962
- Atomic Distribution in Liquid and Solid Neon and Solid Argon by Neutron DiffractionPhysical Review B, 1958
- XCV. Some observations on the solid state of argonPhilosophical Magazine, 1956
- Density and Expansivity of Solid ArgonNature, 1956
- Die Kristallstruktur des ArgonsZeitschrift für Physik, 1924