Wet Chemical Etching for V‐grooves into InP Substrates
- 1 August 1998
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 145 (8) , 2931-2937
- https://doi.org/10.1149/1.1838739
Abstract
A systematic study has been performed on the production of V‐grooves in (100) InP substrates by wet chemical etching. The dissolution process and its dependence on etchant, etch mask, and its accuracy of alignment relative to the [011] or [01¯1] directions has been analyzed. Consequently, the conditions necessary to achieve V‐grooves having (111)A, (111)B, and (211)A sidewalls has been established.Keywords
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