Ion-induced deposition for x-ray mask repair: Rate optimization using a time-dependent model
- 1 September 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (5) , 2664-2669
- https://doi.org/10.1116/1.585668
Abstract
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