Electrostatic Coupling of Antenna and the Shielding Effect in Inductive RF Plasmas

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Abstract
Capacitive coupling from a current-flowing antenna to inductive rf plasma plays an important role not only in the discharge mechanism but also in the impurity release from materials around the antenna. As a result of this coupling, there appears a large negative dc voltage (V DC) on the surface of material which insulates the antenna conductor from the plasma. The magnitude of V DC is directly measured as a function of rf power, thickness of the insulating material, and the position along the antenna. A simple model to describe the electrostatic antenna-plasma coupling is proposed. In addition, the effect of Faraday shields on the inductively coupled rf discharge is presented.

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