Martensitic transformation in thin-film (TiPd)50(TiNi)50

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Abstract
We have produced thin films of (TiPd)50(TiNi)50 shape-memory alloy (SMA) by dc magnetron sputtering at an elevated temperature. 'As-grown' films were crystalline, requiring no post-deposition anneal. A SMA film, approximately 1.5mum thick, grown on a Si(100) cantilever, approximately 80mum thick, showed a martensitic transformation near room temperature. The martensitic transformation was observed by measuring cantilever damping, cantilever bending and X-ray diffraction (XRD) patterns, all as functions of temperature. The XRD patterns indicated that the film was purely austenite (B2 phase) at high temperatures and was a mixture of austenite and martensite at low temperatures. Damping measurements suggest that the low-temperature martensite is a mixture of B19 and B19 phases. The transformation was reversible and exhibited a temperature hysteresis of approximately 25o.

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