High rate deposition of hafnium nitride by activated reactive evaporation (ARE)
- 1 November 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 63 (2) , 327-331
- https://doi.org/10.1016/0040-6090(79)90036-1
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Machining evaluation of cemented carbide tools coated with HfN and TiC by the activated reactive evaporation processThin Solid Films, 1978
- Synthesis and morphology of various carbides in the Ta–C systemJournal of Vacuum Science and Technology, 1975
- Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatingsJournal of Vacuum Science and Technology, 1975
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972
- The crystal structures of Hf3N2 and Hf4N3Metallurgical Transactions, 1970