Diamond chemical vapour deposition using tantalum filaments in H2CH4O2 gas mixtures
- 31 March 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (2-4) , 373-377
- https://doi.org/10.1016/0925-9635(93)90085-g
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Effect of oxygen on filament activity in diamond chemical vapor depositionJournal of Vacuum Science & Technology A, 1991
- Activity of tungsten and rhenium filaments in CH4/H2 and C2H2/H2 mixtures: Importance for diamond CVDJournal of Materials Research, 1990
- Diamond deposition on cemented carbide by chemical vapour deposition using a tantalum filamentJournal of Materials Science, 1990