Cold-plasma production for recombination extreme-ultraviolet lasers by optical-field-induced ionization
- 1 June 1989
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America B
- Vol. 6 (6) , 1195-1199
- https://doi.org/10.1364/josab.6.001195
Abstract
For high-intensity, linearly polarized light, above-threshold ionization results from the time difference between the instant of ionization and the electric field maximum. Cold plasmas suitable for recombination extreme-ultraviolet (XUV) lasers can be produced if appropriate wavelength-ionizing radiation is used. Multiphoton ionization intensities are calculated for representative XUV laser schemes.Keywords
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