A monolithic thermal inkjet printhead utilizing electrochemical etching and two-step electroplating techniques
- 19 November 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 601-604
- https://doi.org/10.1109/iedm.1995.499293
Abstract
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This publication has 1 reference indexed in Scilit:
- Formation of self-aligned holes in an arbitrary pattern in silicon substrateApplied Physics Letters, 1995