Properties and Structure of Rf-Sputtered Amorphous Films in the AlPO4-Al2O3 System

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Abstract
Amorphous films in the system of AlPO4-Al2O3 were prepared by rf sputtering, and their physical properties such as density, refractive index and thermal expansion coefficient, and the infrared absorption spectra were measured. The physical properties and the infrared absorption spectrum of an amorphous AlPO4 were very similar to those of SiO2 glass. All the physical properties of the amorphous AlPO4-Al2O3 films had the same compositional dependence; that is, they increased linearly with increasing Al2O3 content up to about 80mol% Al2O3, beyond which they increased more rapidly. The results of infrared spectra indicated that the coordination number of aluminum ions was 4 below about 80mol% Al2O3 content, but increased rapidly to about 5 above 80mol% Al2O3, reaching to the value of an amorphous Al2O3 film.

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