Absolute cross sections for the dissociative electron impact ionization of the CFx (x = 1−3) free radicals

This publication has 17 references indexed in Scilit:

• On the partial ionization cross-sections for CF4 by use of the pulsed-electron-beam time-of-flight method
  International Journal of Mass Spectrometry and Ion Processes, 1993
• Formation of negative ions by electron impact on SiF4 and CF4
  The European Physical Journal D, 1992
• Further studies of the continuous UV emission produced by electron impact on CF4
  The European Physical Journal D, 1992
• Positive ion pair production by electron impact dissociative ionization of CF4
  Chemical Physics Letters, 1992
• Discrimination effects for ions with high initial kinetic energy in a Nier-type ion source and partial and total electron ionization cross-sections of CF4
  International Journal of Mass Spectrometry and Ion Processes, 1992
• Study of Surface Reaction Probability of CF_x Radicals by Trench Deposition Method
  Japanese Journal of Applied Physics, 1991
• A model of the chemical processes occurring in CF4/O2 discharges used in plasma etching
  Plasma Chemistry and Plasma Processing, 1986
• Electron-Impact Ionization and Dissociative Ionization of the CD3and CD2Free Radicals
  Physical Review Letters, 1984
• Decomposition and product formation in CF4-O2 plasma etching silicon in the afterglow
  Journal of Applied Physics, 1981
• Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
  Journal of Applied Physics, 1978